Figure 9From: The influence of process parameters and pulse ratio of precursors on the characteristics of La1 − x Al x O3 films deposited by atomic layer depositionAFM images of sample C and sample D. (a) 1 × 1 μm2 for sample D. (b) 1 × 1 μm2 for sample C. (c) 0.5 × 0.5 μm2 for sample D. (d) 0.5 × 0.5 μm2 for sample C.Back to article page