Skip to main content

Table 2 Samples with different La/Al precursor pulse ratios

From: The influence of process parameters and pulse ratio of precursors on the characteristics of La1 − x Al x O3 films deposited by atomic layer deposition

Sample Order and cycles for as-deposited films Thickness (nm)
A (Al2O3/La2O3)*50+ (Al2O3)*5 10.469
B (Al2O3/2*La2O3)*35+ (Al2O3)*5 10.757
C Al2O3/3*La2O3)*27+ (Al2O3)*5 8.895
D (La2O3)*121+ (Al2O3)*5 8.850