Fig. 1
Oblique angle deposition. a Schematic representation of oblique angle deposition (OAD) by e-beam evaporation. The angle between the substrate normal and vapor flux is θ, and the substrate rotation along the substrate normal axis is ϕ. b Islands of depositing materials (with the height of h) are formed on the substrate at the initial stage of OAD. The magnified view shows self-shadowed regions (h tan θ) formed by highly oblique angle of vapor flux. c Highly porous nanorod arrays fabricated by OAD. d Cross-sectional SEM image of SiO2 nanorod film with a deposition angle of 80°