Erratum to: Optical properties and bandgap evolution of ALD HfSiOxfilms
© Yang et al. 2015
Received: 3 September 2015
Accepted: 16 September 2015
Published: 29 September 2015
The original article was published in Nanoscale Research Letters 2015 10:32
The authors of Nanoscale Research Letters 2015, 10:32 (DOI 10.1186/s11671-014-0724-z)  omitted to acknowledge that all ellipsometric data discussed in the article, including those displayed in Figure 1, were recorded in the laboratory of the Semiconductor Physics Group, Institut für Experimentelle Physik, Universitāt Leipzig, with the active involvement and under the guidance of Tammo Böntgen, Rüdiger Schmidt-Grund, and Marius Grundmann.
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