- Open Access
Erratum to: Optical properties and bandgap evolution of ALD HfSiOxfilms
© Yang et al. 2015
- Received: 3 September 2015
- Accepted: 16 September 2015
- Published: 29 September 2015
The original article was published in Nanoscale Research Letters 2015 10:32
The authors of Nanoscale Research Letters 2015, 10:32 (DOI 10.1186/s11671-014-0724-z)  omitted to acknowledge that all ellipsometric data discussed in the article, including those displayed in Figure 1, were recorded in the laboratory of the Semiconductor Physics Group, Institut für Experimentelle Physik, Universitāt Leipzig, with the active involvement and under the guidance of Tammo Böntgen, Rüdiger Schmidt-Grund, and Marius Grundmann.
Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.