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Erratum to: Optical properties and bandgap evolution of ALD HfSiOxfilms

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The original article was published in Nanoscale Research Letters 2015 10:32

The authors of Nanoscale Research Letters 2015, 10:32 (DOI 10.1186/s11671-014-0724-z) [1] omitted to acknowledge that all ellipsometric data discussed in the article, including those displayed in Figure 1, were recorded in the laboratory of the Semiconductor Physics Group, Institut für Experimentelle Physik, Universitāt Leipzig, with the active involvement and under the guidance of Tammo Böntgen, Rüdiger Schmidt-Grund, and Marius Grundmann.


  1. 1.

    Yang W, Fronk M, Geng Y, Chen L, Sun QQ, Gordan OD, et al. Optical properties and bandgap evolution of ALD HfSiOxfilms. Nanoscale Res Lett. 2015;10:32.

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Correspondence to Lin Chen or Qing-Qing Sun.

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The online version of the original article can be found under doi:10.1186/s11671-014-0724-z.

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