Fig. 1From: On-Demand Fabrication of Si/SiO2 Nanowire Arrays by Nanosphere Lithography and Subsequent Thermal OxidationA schematic diagram of Si/SiO2 NW arrays fabrication. a A self-assembled colloidal monolayer was formed. b Non-close-packed colloidal monolayer was obtained after argon plasma treatment. c A Ti/Au film was evaporated on top, and the colloidal monolayer was peeled off by ultrasonication in toluene. d Si NW arrays etched via MACE using gold mesh as catalysts. e Gold mesh was dissolved in aqua regia and Si/SiO2 core-shell cylindrical structure was obtained by the following thermal oxidation processBack to article page