Table 1 The AM1.5G-weighted reflectance of samples etched by solutions A and B with different post-etch treatments, using polished wafer as a reference
From: Optimization of the Surface Structure on Black Silicon for Surface Passivation
Weighted reflectance (%) | |||
|---|---|---|---|
Post-etch treatment | Etch solution | ||
A 10 min | B 5 min | B 10 min | |
As-prepared | 8.4 | 13.6 | 8.6 |
NaOH (0.05 wt%) | 12.0 | 10.7 | 9.8 |
NH4OH:H2O2:H2O = 0.5:1:5 | 9.9 | 13.0 | 6.0 |
Reference (polished) | 36.5 | ||