Fig. 5From: Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer DepositionGIXRD diffractograms for as-grown and annealed La2O3 after being exposed to air for 48 h. a 10 nm La2O3 films annealed at 600 °C and b 20 nm La2O3 films annealed at 600 °C. Hexagonal La2O3 and hexagonal La(OH)3 patterns are added for comparisonBack to article page