Fig. 6From: Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer DepositionHRTEM images for the annealed La2O3 films after being exposed to air for 48 h. a 10 nm La2O3 film annealed at 600 °C and b 20 nm La2O3 film annealed at 600 °CBack to article page