Fig. 5From: A Convenient and Effective Method to Deposit Low-Defect-Density nc-Si:H Thin Film by PECVDDependence of spin density (a) and effective minority carrier lifetime (b) on different deposition pressures. The high-resolution AFM image (c) and SEM image (d) of nc-Si:H thin film deposited under 450 PaBack to article page