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Table 1 Summary of the properties of Al₂O₃ films deposited by different deposition methods

From: Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers

	ALD Al₂O₃	EB Al₂O₃	Sputtering Al₂O₃
Thickness (nm)	20.00	20.00	20.00
Surface roughness (nm)	0.83	2.53	0.68
Density	2.69	2.59	2.56
Composition (%)
Al	34.36	32.74	29.84
O	65.27	67.24	70.02
C	0.37	0.02	0.14

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