Fig. 2From: Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and OzoneThe changes of thickness (a) and deposition rate (b) for ZrO2 thin films as a function of the number of deposition cycles. The deposition temperature is 250 °CBack to article page