Fig. 4From: Structure and Dielectric Property of High-k ZrO2 Films Grown by Atomic Layer Deposition Using Tetrakis(Dimethylamido)Zirconium and OzoneThe changes of thickness (a) and refractive index (b) for the films deposited at 110~350 °C after post-deposition annealing at 400 °CBack to article page