Fig. 7From: Plasma-Enhanced Chemical Vapor Deposition of Acetylene on Codeposited Bimetal Catalysts Increasing Graphene Sheet Continuity Under Low-Temperature Growth ConditionsRaman maps showing I2D:G > 1.0 for a CVD synthesis with 7 min exposure time versus b 10 W ICPCVD synthesis with 30s exposure time. Both growths are 450 °C on codeposited Ni-Au catalyst. The addition of plasma increases layer uniformity from 11.6% (a) to 99% (b)Back to article page