Co-dosing Ozone and Deionized Water as Oxidant Precursors of ZnO Thin Film Growth by Atomic Layer Deposition

Table 1 Pulse number of ozone, thermal annealing, strain, and stress of specimens

Sample	Pulse number of ozone	Thermal annealing	Strain (%)	Stress (GPa)
A	0	No	1.08	4.90
B	3	No	0.74	3.37
C	3	300 °C, 1 h, O₂	0.49	2.22