Fig. 4From: Fabrication of High-Quality and Strain-Relaxed GeSn Microdisks by Integrating Selective Epitaxial Growth and Selective Wet Etching MethodsSEM images after selective wet etching. a 5 μm diameter Ge0.96Sn0.04 circular mesas after 510 s etching. b, c 5 μm diameter Ge0.902Sn0.098 circular mesas after 510 s etchingBack to article page