Fig. 3From: Effect of the Niobium-Doped Titanium Oxide Thickness and Thermal Oxide Layer for Silicon Quantum Dot Solar Cells as a Dopant-Blocking LayerDepth profile of phosphorus atoms in Si-QDML/TiOx:Nb/thermal oxide/n++-poly-Si structure using a 2-nm-thick TiOx:Nb and b 10-nm-thick TiOx:NbBack to article page