Fig. 1From: Post-annealing Effect on Optical and Electronic Properties of Thermally Evaporated MoOX Thin Films as Hole-Selective Contacts for p-Si Solar Cellsa Photographs and b transmittance spectra of the 10-nm-thick MoOX films on silica glass annealed in air for 5 min at different temperatures. c Refractive indices n and d extinction coefficient k curves of the 20-nm-thick MoOX films on polished silicon wafersBack to article page